flash memory

History

Background

The origins of flash memory can be traced to the development of the floating-gate MOSFET (FGMOS), also known as the floating-gate transistor. The original MOSFET was invented at Bell Labs between 1959 and 1960. Dawon Kahng went on to develop a variation, the floating-gate MOSFET, with Taiwanese-American engineer Simon Min Sze at Bell Labs in 1967. They proposed that it could be used as floating-gate memory cells for storing a form of programmable read-only memory (PROM) that is both non-volatile and re-programmable.

Early types of floating-gate memory included EPROM (erasable PROM) and EEPROM (electrically erasable PROM) in the 1970s. However, early floating-gate memory required engineers to build a memory cell for each bit of data, which proved to be cumbersome, slow, and expensive, restricting floating-gate memory to niche applications in the 1970s, such as military equipment and the earliest experimental mobile phones.

Modern EEPROM based on Fowler-Nordheim tunnelling to erase data was invented by Bernward and patented by Siemens in 1974. It was further developed between 1976 and 1978 by Eliyahou Harari at Hughes Aircraft Company, as well as by George Perlegos and others at Intel.

Invention and commercialization

Fujio Masuoka invented flash memory at Toshiba in 1980. The improvement between EEPROM and flash is that flash is programmed in blocks while EEPROM is programmed in bytes. According to Toshiba, the name "flash" was suggested by Masuoka's colleague, Shōji Ariizumi, because the erasure process of the memory contents reminded him of the flash of a camera. Masuoka and colleagues presented the invention of NOR flash in 1984, and then NAND flash at the IEEE 1987 International Electron Devices Meeting (IEDM) held in San Francisco.

Toshiba commercially launched NAND flash memory in 1987. Intel Corporation introduced the first commercial NOR type flash chip in 1988. NOR-based flash has long erase and write times, but provides full address and data buses, allowing random access to any memory location. This makes it a suitable replacement for older read-only memory (ROM) chips, which are used to store program code that rarely needs to be updated, such as a computer's BIOS or the firmware of set-top boxes. Its endurance may be from as little as 100 erase cycles for an on-chip flash memory, to a more typical 10,000 or 100,000 erase cycles, up to 1,000,000 erase cycles. NOR-based flash was the basis of early flash-based removable media; CompactFlash was originally based on it, although later cards moved to less expensive NAND flash.

NAND flash has reduced erase and write times, and requires less chip area per cell, thus allowing greater storage density and lower cost per bit than NOR flash. However, the I/O interface of NAND flash does not provide a random-access external address bus. Rather, data must be read on a block-wise basis, with typical block sizes of hundreds to thousands of bits. This makes NAND flash unsuitable as a drop-in replacement for program ROM, since most microprocessors and microcontrollers require byte-level random access. In this regard, NAND flash is similar to other secondary data storage devices, such as hard disks and optical media, and is thus highly suitable for use in mass-storage devices, such as memory cards and solid-state drives (SSD). For example, SSDs store data using multiple NAND flash memory chips.

The first NAND-based removable memory card format was SmartMedia, released in 1995. Many others followed, including MultiMediaCard, Secure Digital, Memory Stick, and xD-Picture Card.

Later developments

A new generation of memory card formats, including RS-MMC, miniSD and microSD, feature extremely small form factors. For example, the microSD card has an area of just over 1.5 cm², with a thickness of less than 1 mm.

NAND flash has achieved significant levels of memory density as a result of several major technologies that were commercialized during the late 2000s to early 2010s.

NOR flash was the most common type of Flash memory sold until 2005, when NAND flash overtook NOR flash in sales.

Multi-level cell (MLC) technology stores more than one bit in each memory cell. NEC demonstrated multi-level cell (MLC) technology in 1998, with an 80Mb flash memory chip storing 2 bits per cell. STMicroelectronics also demonstrated MLC in 2000, with a 64MB NOR flash memory chip. In 2009, Toshiba and SanDisk introduced NAND flash chips with QLC technology storing 4 bits per cell and holding a capacity of 64Gb. Samsung Electronics introduced triple-level cell (TLC) technology storing 3-bits per cell, and began mass-producing NAND chips with TLC technology in 2010.

Charge trap flash

Charge trap flash
Charge trap flash (CTF) technology replaces the polysilicon floating gate, which is sandwiched between a blocking gate oxide above and a tunneling oxide below it, with an electrically insulating silicon nitride layer; the silicon nitride layer traps electrons. In theory, CTF is less prone to electron leakage, providing improved data retention.

Because CTF replaces the polysilicon with an electrically insulating nitride, it allows for smaller cells and higher endurance (lower degradation or wear). However, electrons can become trapped and accumulate in the nitride, leading to degradation. Leakage is exacerbated at high temperatures since electrons become more excited with increasing temperatures. CTF technology, however, still uses a tunneling oxide and blocking layer, which are the weak points of the technology, since they can still be damaged in the usual ways (the tunnel oxide can be degraded due to extremely high electric fields and the blocking layer due to Anode Hot Hole Injection (AHHI).

Degradation or wear of the oxides is the reason why flash memory has limited endurance. Data retention goes down (the potential for data loss increases) with increasing degradation, since the oxides lose their electrically-insulating characteristics as they degrade. The oxides must insulate against electrons to prevent them from leaking, which would cause data loss.

In 1991, NEC researchers, including N. Kodama, K. Oyama and Hiroki Shirai, described a type of flash memory with a charge-trap method. In 1998, Boaz Eitan of Saifun Semiconductors (later acquired by Spansion) patented a flash memory technology named NROM that took advantage of a charge trapping layer to replace the conventional floating gate used in conventional flash memory designs. In 2000, an Advanced Micro Devices (AMD) research team led by Richard M. Fastow, Egyptian engineer Khaled Z. Ahmed and Jordanian engineer Sameer Haddad (who later joined Spansion) demonstrated a charge-trapping mechanism for NOR flash memory cells. CTF was later commercialized by AMD and Fujitsu in 2002. 3D V-NAND (vertical NAND) technology stacks NAND flash memory cells vertically within a chip using 3D charge trap flash (CTP) technology. 3D V-NAND technology was first announced by Toshiba in 2007, and the first device, with 24 layers, was commercialized by Samsung Electronics in 2013.

3D integrated circuit technology

3D integrated circuit (3D IC) technology stacks integrated circuit (IC) chips vertically into a single 3D IC package. Toshiba introduced 3D IC technology to NAND flash memory in April 2007, when they debuted a 16GB eMMC compliant (product number THGAM0G7D8DBAI6, often abbreviated THGAM on consumer websites) embedded NAND flash memory package, which was manufactured with eight stacked 2GB NAND flash chips. In September 2007, Hynix Semiconductor (now SK Hynix) introduced 24-layer 3D IC technology, with a 16GB flash memory package that was manufactured with 24 stacked NAND flash chips using a wafer bonding process. Toshiba also used an eight-layer 3D IC for their 32GB THGBM flash package and in 2008. In 2010, Toshiba used a 16-layer 3D IC for their 128GB THGBM2 flash package, which was manufactured with 16 stacked 8GB chips. In the 2010s, 3D ICs came into widespread commercial use for NAND flash memory in mobile devices.

In 2016, Micron and Intel introduced a technology known as CMOS Under the Array/CMOS Under Array (CUA), Core over Periphery (COP), Periphery Under Cell (PUA), or Xtacking, in which the control circuitry for the flash memory is placed under or above the flash memory cell array. This has allowed for an increase in the number of planes or sections a flash memory chip has, increasing from two planes to four, without increasing the area dedicated to the control or periphery circuitry. This increases the number of IO operations per flash chip or die, but it also introduces challenges when building capacitors for charge pumps used to write to the flash memory. Some flash dies have as many as 6 planes.

As of August 2017, microSD cards with a capacity up to 400 GB (400 billion bytes) were available. Samsung combined 3D IC chip stacking with its 3D V-NAND and TLC technologies to manufacture its 512GB KLUFG8R1EM flash memory package with eight stacked 64-layer V-NAND chips. In 2019, Samsung produced a 1024GB flash package, with eight stacked 96-layer V-NAND package and with QLC technology.

In 2025, researchers announced experimental success with a device a 400-picosecond write time.

Principles of operation

Floating-gate MOSFET

Floating-gate MOSFET
In flash memory, each memory cell resembles a standard metal–oxide–semiconductor field-effect transistor (MOSFET) except that the transistor has two gates instead of one. The cells can be seen as an electrical switch in which current flows between two terminals (source and drain) and is controlled by a floating gate (FG) and a control gate (CG). The CG is similar to the gate in other MOS transistors, but below this is the FG, which is insulated all around by an oxide layer. The FG is interposed between the CG and the MOSFET channel. Because the FG is electrically isolated by its insulating layer, electrons placed on it are trapped. When the FG is charged with electrons, this charge screens the electric field from the CG, thus increasing the threshold voltage (V_T) of the cell. This means that the V_T of the cell can be changed between the uncharged FG threshold voltage (V_T1) and the higher charged FG threshold voltage (V_T2) by changing the FG charge. In order to read a value from the cell, an intermediate voltage (V_I) between V_T1 and V_T2 is applied to the CG. If the channel conducts at V_I, the FG must be uncharged (if it were charged, there would not be conduction because V_I is less than V_T2). If the channel does not conduct at the V_I, it indicates that the FG is charged. The binary value of the cell is sensed by determining whether there is current flowing through the transistor when V_I is asserted on the CG. In a multi-level cell device, which stores more than one bit per cell, the amount of current flow is sensed (rather than simply its presence or absence), in order to determine more precisely the level of charge on the FG.

Floating gate MOSFETs are so named because there is an electrically insulating tunnel oxide layer between the floating gate and the silicon, so the gate "floats" above the silicon. The oxide keeps the electrons confined to the floating gate. Degradation or wear (and the limited endurance of floating gate Flash memory) occurs due to the extremely high electric field (10 million volts per centimeter) experienced by the oxide. Such high voltage densities can break atomic bonds over time in the relatively thin oxide, gradually degrading its electrically insulating properties and allowing electrons to be trapped in and pass through freely (leak) from the floating gate into the oxide, increasing the likelihood of data loss since the electrons (the quantity of which is used to represent different charge levels, each assigned to a different combination of bits in MLC Flash) are normally in the floating gate. This is why data retention goes down and the risk of data loss increases with increasing degradation. The silicon oxide in a cell degrades with every erase operation. The degradation increases the amount of negative charge in the cell over time due to trapped electrons in the oxide and negates some of the control gate voltage. Over time, this also makes erasing the cell slower; to maintain the performance and reliability of the NAND chip, the cell must be retired from use. Endurance also decreases with the number of bits in a cell. With more bits in a cell, the number of possible states (each represented by a different voltage level) in a cell increases and is more sensitive to the voltages used for programming. Voltages may be adjusted to compensate for degradation of the silicon oxide, and as the number of bits increases, the number of possible states also increases and thus the cell is less tolerant of adjustments to programming voltages, because there is less space between the voltage levels that define each state in a cell.

Fowler–Nordheim tunneling

Fowler–Nordheim tunneling
The process of moving electrons from the control gate and into the floating gate is called Fowler–Nordheim tunneling, and it fundamentally changes the characteristics of the cell by increasing the MOSFET's threshold voltage. This, in turn, changes the drain-source current that flows through the transistor for a given gate voltage, which is ultimately used to encode a binary value. The Fowler-Nordheim tunneling effect is reversible, so electrons can be added to or removed from the floating gate, processes traditionally known as writing and erasing.

Internal charge pumps

Despite the need for relatively high programming and erasing voltages, virtually all flash chips today require only a single supply voltage and produce the high voltages that are required using on-chip charge pumps.

Over half the energy used by a 1.8 V-NAND flash chip is lost in the charge pump itself. Since boost converters are inherently more efficient than charge pumps, researchers developing low-power SSDs have proposed returning to the dual Vcc/Vpp supply voltages used on all early flash chips, driving the high Vpp voltage for all flash chips in an SSD with a single shared external boost converter.

In spacecraft and other high-radiation environments, the on-chip charge pump is the first part of the flash chip to fail, although flash memories will continue to work in read-only mode at much higher radiation levels.

NOR flash

Programming

• an elevated on-voltage (typically >5 V) is applied to the CG
• the channel is now turned on, so electrons can flow from the source to the drain (assuming an NMOS transistor)
• the source-drain current is sufficiently high to cause some high energy electrons to jump through the insulating layer onto the FG, via a process called hot-electron injection.

Erasing

To erase a NOR flash cell (resetting it to the "1" state), a large voltage of the opposite polarity is applied between the CG and source terminal, pulling the electrons off the FG through Fowler–Nordheim tunneling (FN tunneling). This is known as Negative gate source erase. Newer NOR memories can erase using negative gate channel erase, which biases the wordline on a NOR memory cell block and the P-well of the memory cell block to allow FN tunneling to be carried out, erasing the cell block. Older memories used source erase, in which a high voltage was applied to the source and then electrons from the FG were moved to the source. Modern NOR flash memory chips are divided into erase segments (often called blocks or sectors). The erase operation can be performed only on a block-wise basis; all the cells in an erase segment must be erased together. Programming of NOR cells, however, generally can be performed one byte or word at a time.

NAND flash

NAND flash also uses a grid of floating-gate transistors (see above), but they are connected in a way that resembles a NAND gate: the transistors corresponding to a given bit of several words are connected in series, and the bitline is pulled low if all the word lines are pulled high (above the transistors' V_T). To read the bit of a particular word, its wordline is put low and all the other wordlines are put high, and then the bitline will reflect the state of the floating gate of the desired cell. These groups are then connected via some additional transistors to a NOR-style bit line array in the same way that single transistors are linked in NOR flash.

Compared to NOR flash, replacing single transistors with serial-linked groups adds an extra level of addressing. Whereas NOR flash might address memory by page then word, NAND flash might address it by page, word and bit. Bit-level addressing suits bit-serial applications (such as hard disk emulation), which access only one bit at a time. applications, on the other hand, require every bit in a word to be accessed simultaneously. This requires word-level addressing. In any case, both bit and word addressing modes are possible with either NOR or NAND flash.

To read data, first the desired group is selected (in the same way that a single transistor is selected from a NOR array). Next, most of the word lines are pulled up above V_T2, while one of them is pulled up to V_I. The series group will conduct (and pull the bit line low) if the selected bit has not been programmed.

Despite the additional transistors, the reduction in ground wires and bit lines allows a denser layout and greater storage capacity per chip. (The ground wires and bit lines are actually much wider than the lines in the diagrams.) In addition, NAND flash is typically permitted to contain a certain number of faults (NOR flash, as is used for a BIOS ROM, is expected to be fault-free). Manufacturers try to maximize the amount of usable storage by shrinking the size of the transistors or cells, however the industry can avoid this and achieve higher storage densities per die by using 3D NAND, which stacks cells on top of each other.

NAND flash cells are read by analysing their response to various voltages.

Writing and erasing

NAND flash uses tunnel injection for writing and tunnel release for erasing. NAND flash memory forms the core of the removable USB storage devices known as USB flash drives, as well as most memory card formats and solid-state drives available today.

The hierarchical structure of NAND flash starts at a cell level which establishes strings, then pages, blocks, planes and ultimately a die. A string is a series of connected NAND cells in which the source of one cell is connected to the drain of the next one. Depending on the NAND technology, a string typically consists of 32 to 128 NAND cells. Strings are organised into pages which are then organised into blocks in which each string is connected to a separate line called a bitline. All cells with the same position in the string are connected through the control gates by a wordline. A plane contains a certain number of blocks that are connected through the same bitline. A flash die consists of one or more planes, and the peripheral circuitry that is needed to perform all the read, write, and erase operations.

The architecture of NAND flash means that data can be read and programmed (written) in pages, typically between 4 KiB and 16 KiB in size, but can only be erased at the level of entire blocks consisting of multiple pages. When a block is erased, all the cells are logically set to 1. Data can only be programmed in one pass to a page in a block that was erased. The programming process is set one or more cells from 1 to 0. Any cells that have been set to 0 by programming can only be reset to 1 by erasing the entire block. This means that before new data can be programmed into a page that already contains data, the current contents of the page plus the new data must all be copied to a new, erased page. If a suitable erased page is available, the data can be written to it immediately. If no erased page is available, a block must be erased before copying the data to a page in that block. The old page is then marked as invalid and is available for erasing and reuse. This is different from operating system LBA view, for example, if operating system writes 1100 0011 to the flash storage device (such as SSD), the data actually written to the flash memory may be 0011 1100.

Vertical NAND

Structure

V-NAND uses a charge trap flash geometry (which was commercially introduced in 2002 by AMD and Fujitsu) that stores charge on an embedded silicon nitride film. Such a film is more robust against point defects and can be made thicker to hold larger numbers of electrons. V-NAND wraps a planar charge trap cell into a cylindrical form. As of 2020, 3D NAND flash memories by Micron and Intel instead use floating gates, however, Micron 128 layer and above 3D NAND memories use a conventional charge trap structure, due to the dissolution of the partnership between Micron and Intel. Charge trap 3D NAND flash is thinner than floating gate 3D NAND. In floating gate 3D NAND, the memory cells are completely separated from one another, whereas in charge trap 3D NAND, vertical groups of memory cells share the same silicon nitride material.

An individual memory cell is made up of one planar polysilicon layer containing a hole filled by multiple concentric vertical cylinders. The hole's polysilicon surface acts as the gate electrode. The outermost silicon dioxide cylinder acts as the gate dielectric, enclosing a silicon nitride cylinder that stores charge, in turn enclosing a silicon dioxide cylinder as the tunnel dielectric that surrounds a central rod of conducting polysilicon which acts as the conducting channel.

Memory cells in different vertical layers do not interfere with each other, as the charges cannot move vertically through the silicon nitride storage medium, and the electric fields associated with the gates are closely confined within each layer. The vertical collection is electrically identical to the serial-linked groups in which conventional NAND flash memory is configured. There is also string stacking, which builds several 3D NAND memory arrays or "plugs" separately, but stacked together to create a product with a higher number of 3D NAND layers on a single die. Often, two or 3 arrays are stacked. The misalignment between plugs is in the order of 30 to 10nm.

Construction

Growth of a group of V-NAND cells begins with an alternating stack of conducting (doped) polysilicon layers and insulating silicon dioxide layers.

The next step is to form a cylindrical hole through these layers. In practice, a 128 Gbit V-NAND chip with 24 layers of memory cells requires about 2.9 billion such holes. Next, the hole's inner surface receives multiple coatings, first silicon dioxide, then silicon nitride, then a second layer of silicon dioxide. Finally, the hole is filled with conducting (doped) polysilicon.

Performance

As of 2013 V-NAND flash architecture allows read and write operations twice as fast as conventional NAND and can last up to 10 times as long, while consuming 50 percent less power. They offer comparable physical bit density using 10-nm lithography but may be able to increase bit density by up to two orders of magnitude, given V-NAND's use of up to several hundred layers. As of 2020, V-NAND chips with 160 layers are under development by Samsung. As the number of layers increases, the capacity and endurance of flash memory may be increased.

Cost

Limitations

Block erasure

One limitation of flash memory is that it can be erased only a block at a time. This generally sets all bits in the block to 1. Starting with a freshly erased block, any location within that block can be programmed. However, once a bit has been set to 0, only by erasing the entire block can it be changed back to 1. In other words, flash memory (specifically NOR flash) offers random-access read and programming operations but does not offer arbitrary random-access rewrite or erase operations. A location can, however, be rewritten as long as the new value's 0 bits are a superset of the over-written values. For example, a nibble value may be erased to 1111, then written as 1110. Successive writes to that nibble can change it to 1010, then 0010, and finally 0000. Essentially, erasure sets all bits to 1, and programming can only clear bits to 0.

Some file systems designed for flash devices make use of this rewrite capability, for example YAFFS1, to represent sector metadata. Other flash file systems, such as YAFFS2, never make use of this "rewrite" capability – they do a lot of extra work to meet a "write once rule".

Although data structures in flash memory cannot be updated in completely general ways, this allows members to be "removed" by marking them as invalid. This technique may need to be modified for multi-level cell devices, where one memory cell holds more than one bit.

Common flash devices such as USB flash drives and memory cards provide only a block-level interface, or flash translation layer (FTL), which writes to a different cell each time to wear-level the device. This prevents incremental writing within a block; however, it does help the device from being prematurely worn out by intensive write patterns.

Data retention

Memory wear

Another limitation is that flash memory has a finite number of program–erase cycles (typically written as P/E cycles). Micron Technology and Sun Microsystems announced an SLC NAND flash memory chip rated for 1,000,000 P/E cycles on 17 December 2008.

The guaranteed cycle count may apply only to block zero (as is the case with TSOP NAND devices), or to all blocks (as in NOR). This effect is mitigated in some chip firmware or file system drivers by counting the writes and dynamically remapping blocks in order to spread write operations between sectors; this technique is called wear leveling. Another approach is to perform write verification and remapping to spare sectors in case of write failure, a technique called bad block management (BBM). For portable consumer devices, these wear out management techniques typically extend the life of the flash memory beyond the life of the device itself, and some data loss may be acceptable in these applications. For high-reliability data storage, however, it is not advisable to use flash memory that would have to go through a large number of programming cycles. This limitation also exists for "read-only" applications such as thin clients and routers, which are programmed only once or at most a few times during their lifetimes, due to read disturb (see below).

In December 2012, Taiwanese engineers from Macronix revealed their intention to announce at the 2012 IEEE International Electron Devices Meeting that they had figured out how to improve NAND flash storage read/write cycles from 10,000 to 100 million cycles using a "self-healing" process that used a flash chip with "onboard heaters that could anneal small groups of memory cells." The built-in thermal annealing was to replace the usual erase cycle with a local high temperature process that not only erased the stored charge, but also repaired the electron-induced stress in the chip, giving write cycles of at least 100 million. The result was to be a chip that could be erased and rewritten over and over, even when it should theoretically break down. As promising as Macronix's breakthrough might have been for the mobile industry, however, there were no plans for a commercial product featuring this capability to be released any time in the near future.

Read disturb

The method used to read NAND flash memory can cause nearby cells in the same memory block to change over time (become programmed). This is known as read disturb. The threshold number of reads is generally in the hundreds of thousands of reads between intervening erase operations. If reading continually from one cell, that cell will not fail but rather one of the surrounding cells will on a subsequent read. To avoid the read disturb problem the flash controller will typically count the total number of reads to a block since the last erase. When the count exceeds a target limit, the affected block is copied over to a new block, erased, then released to the block pool. The original block is as good as new after the erase. If the flash controller does not intervene in time, however, a read disturb error will occur with possible data loss if the errors are too numerous to correct with an error-correcting code.

X-ray effects

Most flash ICs come in ball grid array (BGA) packages, and even the ones that do not are often mounted on a PCB next to other BGA packages. After PCB assembly, boards with BGA packages are often X-rayed to see if the balls are making proper connections to the proper pad, or if the BGA needs rework. These X-rays can erase programmed bits in a flash chip (convert programmed "0" bits into erased "1" bits). Erased bits ("1" bits) are not affected by X-rays.

Some manufacturers are now making X-ray-proof SD and USB memory devices.

Low-level access

The low-level interface to flash memory chips differs from those of other memory types such as DRAM, ROM, and EEPROM, which support bit-alterability (both zero to one and one to zero) and random access via externally accessible address buses.

NOR memory has an external address bus for reading and programming. For NOR memory, reading and programming are random-access, and unlocking and erasing are block-wise. For NAND memory, reading and programming are page-wise, and unlocking and erasing are block-wise.

NOR memories

NAND memories

NAND flash architecture was introduced by Toshiba in 1989. These memories are accessed much like block devices, such as hard disks. Each block consists of a number of pages. The pages are typically 512, 2,048, or 4,096 bytes in size. Associated with each page are a few bytes (typically 1/32 of the data size) that can be used for storage of an error correcting code (ECC) checksum.

Typical block sizes include:

• 32 pages of 512+16 bytes each for a block size (effective) of 16 KiB
• 64 pages of 2,048+64 bytes each for a block size of 128 KiB
• 64 pages of 4,096+128 bytes each for a block size of 256 KiB
• 128 pages of 4,096+128 bytes each for a block size of 512 KiB
• 2048 pages of 16,386+128 bytes each for a block size of 32768 KiB

Standardization

A group called the Open NAND Flash Interface Working Group (ONFI) has developed a standardized low-level interface for NAND flash chips. This allows interoperability between conforming NAND devices from different vendors. The ONFI specification version 1.0 was released on 28 December 2006. It specifies:

• A standard physical interface (pinout) for NAND flash in TSOP-48, WSOP-48, LGA-52, and BGA-63 packages
• A standard command set for reading, writing, and erasing NAND flash chips
• A mechanism for self-identification (comparable to the serial presence detection feature of SDRAM memory modules)

Distinction between NOR and NAND flash

NOR and NAND flash differ in two important ways:

• The connections of the individual memory cells are different.
• The interface provided for reading and writing the memory is different; NOR allows random access as it can be either byte-addressable or word-addressable, with words being for example 32 bits long, while NAND allows only page access.

Write endurance

The write endurance of SLC floating-gate NOR flash is typically equal to or greater than that of NAND flash, while MLC NOR and NAND flash have similar endurance capabilities. Examples of endurance cycle ratings listed in datasheets for NAND and NOR flash, as well as in storage devices using flash memory, are provided.

However, by applying certain algorithms and design paradigms such as wear leveling and memory over-provisioning, the endurance of a storage system can be tuned to serve specific requirements.

In order to compute the longevity of the NAND flash, one must account for the size of the memory chip, the type of memory (e.g. SLC/MLC/TLC), and use pattern. Industrial NAND and server NAND are in demand due to their capacity, longer endurance and reliability in sensitive environments.

As the number of bits per cell increases, performance and life of NAND flash may degrade, increasing random read times to 100μs for TLC NAND which is 4 times the time required in SLC NAND, and twice the time required in MLC NAND, for random reads.

Flash file systems

Flash file system
Because of the particular characteristics of flash memory, it is best used with either a controller to perform wear leveling and error correction or specifically designed flash file systems, which spread writes over the media and deal with the long erase times of NOR flash blocks. The basic concept behind flash file systems is the following: when the flash store is to be updated, the file system will write a new copy of the changed data to a fresh block, remap the file pointers, then erase the old block later when it has time.

In practice, flash file systems are used only for memory technology devices (MTDs), which are embedded flash memories that do not have a controller. Removable flash memory cards, SSDs, eMMC/eUFS chips and USB flash drives have built-in controllers to perform wear leveling and error correction so use of a specific flash file system may not add benefit.

Capacity

Multiple chips are often arrayed or die stacked to achieve higher capacities for use in consumer electronic devices such as multimedia players or GPSs. The capacity scaling (increase) of flash chips used to follow Moore's law because they are manufactured with many of the same integrated circuits techniques and equipment. Since the introduction of 3D NAND, scaling is no longer necessarily associated with Moore's law since ever smaller transistors (cells) are no longer used.

Consumer flash storage devices typically are advertised with usable sizes expressed as a small integer power of two (2, 4, 8, etc.) and a conventional designation of megabytes (MB) or gigabytes (GB); e.g., 512 MB, 8 GB. This includes SSDs marketed as hard drive replacements, in accordance with traditional hard drives, which use decimal prefixes. Thus, an SSD marked as "64 GB" is at least bytes (64 GB). Most users will have slightly less capacity than this available for their files, due to the space taken by file system metadata and because some operating systems report SSD capacity using binary prefixes which are somewhat larger than conventional prefixes .

The flash memory chips inside them are sized in strict binary multiples, but the actual total capacity of the chips is not usable at the drive interface. It is considerably larger than the advertised capacity in order to allow for distribution of writes (wear leveling), for sparing, for error correction codes, and for other metadata needed by the device's internal firmware.

In 2005, Toshiba and SanDisk developed a NAND flash chip capable of storing 1 GB of data using multi-level cell (MLC) technology, capable of storing two bits of data per cell. In September 2005, Samsung Electronics announced that it had developed the world's first 2 GB chip.

In March 2006, Samsung announced flash hard drives with capacity of 4 GB, essentially the same order of magnitude as smaller laptop hard drives, and in September 2006, Samsung announced an 8 GB chip produced using a 40 nm manufacturing process.

In January 2008, SanDisk announced availability of their 16 GB MicroSDHC and 32 GB SDHC Plus cards.

More recent flash drives (as of 2012) have much greater capacities, holding 64, 128, and 256 GB.

A joint development at Intel and Micron will allow the production of 32-layer 3.5 terabyte (TB) NAND flash sticks and 10 TB standard-sized SSDs. The device includes 5 packages of 16 × 48 GB TLC dies, using a floating gate cell design.

Flash chips continue to be manufactured with capacities under or around 1 MB (e.g. for BIOS-ROMs and embedded applications).

In July 2016, Samsung announced the 4 TB Samsung 850 EVO which utilizes their 256 Gbit 48-layer TLC 3D V-NAND. In August 2016, Samsung announced a 32 TB 2.5-inch SAS SSD based on their 512 Gbit 64-layer TLC 3D V-NAND. Further, Samsung expects to unveil SSDs with up to 100 TB of storage by 2020.

Transfer rates

Flash memory devices are typically much faster at reading than writing. Performance also depends on the quality of storage controllers, which become more critical when devices are partially full. Even when the only change to manufacturing is die-shrink, the absence of an appropriate controller can result in degraded speeds.

Applications

{{Anchor|SERIAL}}Serial flash

• Many ASICs are pad-limited, meaning that the size of the die is constrained by the number of wire bond pads, rather than the complexity and number of gates used for the device logic. Eliminating bond pads thus permits a more compact integrated circuit, on a smaller die; this increases the number of dies that may be fabricated on a wafer, and thus reduces the cost per die.
• Reducing the number of external pins also reduces assembly and packaging costs. A serial device may be packaged in a smaller and simpler package than a parallel device.
• Smaller and lower pin-count packages occupy less PCB area.
• Lower pin-count devices simplify PCB routing.

Firmware storage

With the increasing speed of modern CPUs, parallel flash devices are often much slower than the memory bus of the computer they are connected to. Conversely, modern SRAM offers access times below 10 ns, while DDR2 SDRAM offers access times below 20 ns. Because of this, it is often desirable to shadow code stored in flash into RAM; that is, the code is copied from flash into RAM before execution, so that the CPU may access it at full speed. Device firmware may be stored in a serial flash chip, and then copied into SDRAM or SRAM when the device is powered-up. Using an external serial flash device rather than on-chip flash removes the need for significant process compromise (a manufacturing process that is good for high-speed logic is generally not good for flash and vice versa). Once it is decided to read the firmware in as one big block it is common to add compression to allow a smaller flash chip to be used. Since 2005, many devices use serial NOR flash to deprecate parallel NOR flash for firmware storage. Typical applications for serial NOR flash include storing firmware for hard drives, BIOS, Option ROM of expansion cards, DSL modems, etc.

Flash memory as a replacement for hard drives

Solid-state drive

Flash memory as RAM

As of 2012 there are attempts to use flash memory as the main computer memory, DRAM.

Archival or long-term storage

Floating-gate transistors in the flash storage device hold charge which represents data. This charge gradually leaks over time, leading to an accumulation of logical errors, also known as "bit rot" or "bit fading".

Data retention

It is unclear how long data on flash memory will persist under archival conditions (i.e., benign temperature and humidity with infrequent access with or without prophylactic rewrite). Datasheets of Atmel's flash-based "ATmega" microcontrollers typically promise retention times of 20 years at 85 °C (185 °F) and 100 years at 25 °C (77 °F).

The retention span varies among types and models of flash storage. When supplied with power and idle, the charge of the transistors holding the data is routinely refreshed by the firmware of the flash storage. The ability to retain data varies among flash storage devices due to differences in firmware, data redundancy, and error correction algorithms.

An article from CMU in 2015 states "Today's flash devices, which do not require flash refresh, have a typical retention age of 1 year at room temperature." And that retention time decreases exponentially with increasing temperature. The phenomenon can be modeled by the Arrhenius equation.

While flash storage retains data for a longer time if stored at colder temperatures, a higher but not extreme temperature while writing reduces stress and wear on the drive, given that electrons are able to flow more easily, according to Tim Schulte, Pranav Kalavade, and Johnmichael Hands from Intel.

FPGA configuration

Some FPGAs are based on flash configuration cells that are used directly as (programmable) switches to connect internal elements together, using the same kind of floating-gate transistor as the flash data storage cells in data storage devices.

Industry

Semiconductor industry
One source states that, in 2008, the flash memory industry includes about US$9.1 billion in production and sales. Other sources put the flash memory market at a size of more than US$20 billion in 2006, accounting for more than eight percent of the overall semiconductor market and more than 34 percent of the total semiconductor memory market.

In 2012, the market was estimated at $26.8 billion. It can take up to 10 weeks to produce a flash memory chip.

Manufacturers

List of flash memory controller manufacturers
The following were the largest NAND flash memory manufacturers, as of the third quarter of 2025.

1. Samsung Electronics 30%
2. SK Hynix 20%
3. Kioxia 14%
4. Micron Technology 13%
5. YMTC 13%
6. Western Digital Corporation 11%

Shipments

Electronics industry

In addition to individual flash memory chips, flash memory is also embedded in microcontroller (MCU) chips and system-on-chip (SoC) devices. Flash memory is embedded in ARM chips, which have sold 150billion units worldwide As of 2019, and in programmable system-on-chip (PSoC) devices, which have sold 1.1billion units As of 2012. This adds up to at least 151.1billion MCU and SoC chips with embedded flash memory, in addition to the 45.4billion known individual flash chip sales As of 2015, totalling at least 196.5billion chips containing flash memory.

Flash scalability

List of semiconductor scale examples
Due to its relatively simple structure and high demand for higher capacity, NAND flash memory is the most aggressively scaled technology among electronic devices. The heavy competition among the top few manufacturers only adds to the aggressiveness in shrinking the floating-gate MOSFET design rule or process technology node. While the expected shrink timeline is a factor of two every three years per the original version of Moore's law, this has recently been accelerated in the case of NAND flash to a factor of two every two years.

As the MOSFET feature size of flash memory cells reaches the 15–16 nm minimum limit, further flash density increases will be driven by TLC (3 bits/cell) combined with vertical stacking of NAND memory planes. The decrease in endurance and increase in uncorrectable bit error rates that accompany feature size shrinking can be compensated by improved error correction mechanisms. Even with these advances, it may be impossible to economically scale flash to smaller and smaller dimensions as the number of electron holding capacity reduces. Many promising new technologies (such as FeRAM, MRAM, PMC, PCM, ReRAM, and others) are under investigation and development as possible more scalable replacements for flash.

Timeline

Read-only memory#Timeline

See also

• eMMC
• Flash memory controller
• Intel hex file format
• List of flash file systems
• List of flash memory controller manufacturers
• microSDXC (up to 2 TB), and the successor format Secure Digital Ultra Capacity (SDUC) supporting cards up to 128 TiB
• NOR flash replacement
• Open NAND Flash Interface Working Group
• Read-mostly memory (RMM)
• Universal Flash Storage
• USB flash drive security
• Write amplification

Explanatory notes

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External links

• Semiconductor Characterization System has diverse functions Archived 22 October 2018, at web.archive.org
• Understanding and selecting higher performance NAND architectures Archived 31 October 2012, at web.archive.org
• How flash storage works, presentation by David Woodhouse from Intel
• Flash endurance testing
• NAND Flash Data Recovery Cookbook
• Type of Flash Memory by OpenWrt